Abstract
The formation of hydrogenated amorphous silicon–carbon alloy (a-Si1-xCx:H) nanowires is studied for different carbon concentrations (0–7%) by using Ag-assisted electroless etching of the thin a-Si1-xCx:H films deposited by plasma-enhanced chemical vapour deposition from silane/methane gas mixtures. The nanowires morphologies (length, density, …), studied by scanning electron microscopy, strongly depend on the concentration of the etchant (aqueous solution of hydrofluoric acid and silver nitrate), the etching time, and the carbon concentration of the deposited layer.
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