Abstract

Thermal annealing is one of the most indispensable polymer fabrication processes and plays essential roles in controlling morphologies and properties of polymeric materials. We here report that thermal annealing also facilitates polymer adsorption from the melt on planar silicon (Si) substrates, resulting in the formation of a high-density polymer nanolayer with flattened chain confirmations. Three different homopolymers (polystyrene, poly(2-vinylpyridine), and poly(methyl methacrylate)), which have similar inherent stiffness and bulk glass transition temperature (Tg), but have different affinities with Si substrates, were chosen as models. Spin-cast films (∼50 nm in thickness) with the three polymers were prepared on cleaned Si substrates and then placed in a vacuum oven set at a temperature far above the bulk Tg. In order to monitor the polymer adsorption process at the solid-polymer melt interface during thermal annealing, we used the protocol that combines vitrification of the annealed films (via rapi...

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