Abstract
An instrument designed to investigate the chemical behavior of size selected metal clusters on semiconductor surfaces is described. The clusters are formed using laser vaporization, mass selected in a magnetic mass analyzer and deposited on TiO 2 substrates under UHV conditions with impact energies ranging from ≤1 to >100 eV/atom. Intensities of mass selected Au n + and Ag n + clusters range from 0.03 to 3 nA. Intensity, beam focusing and deposition energy are discussed. Once deposited on the surface, the clusters are investigated using scanning tunneling microscopy (STM) and/or temperature programmed desorption (TPD). Examples are presented showing STM images of Au 5 deposited on a clean rutile titania surface and of the TPD of propene from TiO 2.
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