Abstract
Abstract X-ray microprobe experiments at third-generation synchrotron sources will provide trace element analysis of samples with 1 μm × 1 μm spatial resolution and femtogram sensitivity. For these experiments to be possible. X-ray optical elements need to be developed to focus the beam from a hard X-ray undulator to a micron spot size. In June 1991 several different optical elements were tested during a dedicated undulator run at CHESS. The undulator produced radiation similar to that which will be available at third-generation sources like the Advanced Photon Source. Both Fresnel zone plates and multilayer-coated spherical mirrors were tested. With the Fresnel zone plate a spot size of 8.5 μm × 30 μm was achieved in the first order and 6 μm × 20 μm in the second order. With a Kirkpatrick-Baez multilayer mirror system a spot size of 4 μm × 9 μm was achieved. Based on these results, some of the requirements for an optical system suitable for a dedicated microprobe beamline are given.
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