Abstract
A focusing column for a helium field ion source was designed and fabricated. A gimbal assembly and a microchannel plate and mirror are attached to this column for optical axis alignment. A scanning ion microscope image was observed with focused helium ion beams at an acceleration voltage of 12 kV. The resolution was 0.5 μm. Positive resists were exposed at 20 kV. Lines 1.5 μm wide and 0.3 μm deep have been obtained so far. Calculations showed the possibility of a 0.1 μm beam diameter.
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