Fluorine and carbon ion implantation and deposition on metals by plasma source ion implantation

Abstract

Deposition of fluorine containing diamond-like carbon films is an effective solution for the improvement of machine parts in an aggressive aqueous environment when the combination of a hydrophobic surface with good corrosion protection and low friction coefficients is required. Stainless steel and silicon were treated by plasma source ion implantation using the gases CF 4, C 6F 6 and C 6H 5F, in the latter case with previous methane implantation. Depending on the plasma gas there are differences in the fluorine content, depth distribution, film thickness, water contact angle and friction coefficient.