Fluorinated polycarbonate photoresists with adjustable double bond density for electro-optic switch applications by directly written method

Abstract

A series of fluorinated polycarbonates (AF-3OH-PC MAs) terminated by different proportions of acrylate group were synthesized and directly used as photoresist materials. The materials can directly form a cross-linked film under UV light and initiator conditions without the addition of small molecular crosslinkers. The thermal stability (Td up to 416 °C), the absorption at 1550 nm is almost zero and electro-optical stabilities (after 80 °C for 200 h, the r33 remains 91% of the initial value) are significantly improved since the small molecular crosslinkers were not added. The propagation and insertion loss of the device were measured by a cut-back method to be only 0.66 dB/cm and 1 dB, respectively. It may be possible to have an enlightening effect on preparing electro-optical switches with better performance.