Flow measurements in semiconductor processing; New advances in measurement technology

Abstract

Gas flow measurement, control, and distribution are an integral part in meeting present and future semiconductor processing requirements (1). Changes in processing and environmental concerns have put additional pressure not only on accurate measurement of the gas flow, but also in reducing flows. To address the need for more accurate metering of gas flows, NIST has developed primary flow standards which have uncertainties of 0.1% of reading or better over the flow range of 10−9 mol/s to 10−3 mol/s (0.001 sccm to 1000 sccm). These standards have been used to test NIST-designed high repeatability flow transfer standards (2) which can be used to document and improve flow measurements in the semiconductor industry (3). In particular two flowmeters have been developed at NIST; the first is a pressure-based flow sensor and the second a Doppler-shift flowmeter, both of which can be used for in-situ calibration of thermal mass flow controllers or for direct metering of process gases.