Floating-Gate Type Organic Memory with Organic Insulator Thin Film of Plasma Polymerized Methyl Methacrylate

Abstract

To fabricate organic memory device by entirely dry process, plasma polymerized methyl methacrylate (ppMMA) thin films were prepared and they were used as both tunneling layer and gate insulator layer in a floating-gate type organic memory device. The ppMMA thin films were prepared with inductively coupled plasma (ICP) source combined with stabilized monomer vapor control. The ppMMA gate insulator thin film revealed dielectric constant of 3.75 and low leakage current of smaller than 10-9 A/cm. The floating-gate type organic memory device showed promising memory characteristics such as memory window value of 12 V and retention time of over 2 h, where 60 V of writing voltage and -30 V of erasing voltage were applied, respectively.