Abstract
The flexoelectric effect describes the electromechanical coupling of a strain gradient to a polarization and vice versa. This effect scales linearly with permittivity and strain gradients can get very high for dimensions on the micro and nanoscale. Even though the flexoelectric effect can be best exploited within micro or nanoelectromechanical systems (M/NEMS) applications, it has not been established in today`s M/NEMS device architectures as other transducer principles, like piezoelectricity. In this work, values of the converse flexoelectric coefficient for one of the most promising flexoelectric materials, titanium dioxide (TiO2) are provided. The experimental results are based on a carefull characterization of IrO2/TiO2/IrO2 cantilevers. Besides CMOS compatiblity TiO2 is selected as functional thin film material as it offers a very high permittivity and shows no hysteresis or saturation effects as it is neither ferro- nor paraelectric. Additionally, it guarantees a low cost, lead-free realization and can be directly integrated in a standard silicon MEMS fabrication process by sputter deposition. In order to correctly determine the flexoelectric coefficient, other electromechanical coupling effects are considered and assessed. The flexoelectric coefficient is shown to be µeff = 1.78 ± 0.16 nC m−1 at 10 kHz. The flexoelectric coupling constant with a value of 2.75 V is in good agreement with that theoretically predicted by Kogan`s estimate of 3.14 V.
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