Year-end Sale % OFF 
Abstract
A new holographic mask aligner with an imaging resolution of 0.5 μm and an exposure field of 250 × 300 mm has been realised. It has been employed to print a 10.5″-diagonal pattern of 1-μm-diameter microholes for field-emission displays. The CD uniformity achieved over the complete pattern was 8.3% (3σ value). The system, which can handle substrates of up to 370 × 470 mm, offers a powerful alternative for high-resolution flat-panel display manufacture.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
