Abstract
A new holographic mask aligner with an imaging resolution of 0.5 μm and an exposure field of 250 × 300 mm has been realised. It has been employed to print a 10.5″-diagonal pattern of 1-μm-diameter microholes for field-emission displays. The CD uniformity achieved over the complete pattern was 8.3% (3σ value). The system, which can handle substrates of up to 370 × 470 mm, offers a powerful alternative for high-resolution flat-panel display manufacture.
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