Abstract

The ferromagnetic resonance frequency f FMR of soft magnetic films (SMFs) can be expressed by the Kittel equation. Clearly, high 4pM S and H K are needed to achieve a high f FMR in SMFs. Previous research on achieving high f FMR SMFs has mostly been focused on enhancing uniaxial magnetic anisotropy field H K since it is relatively easier to be enhanced by 1–2 orders of magnitude, compared to saturation magnetization that is capped at 24.5 kGs at room temperature1. Magnetron sputtering of SMFs in in-situ magnetic fields and/or subsequent magnetic annealing after deposition have been widely employed for inducing a uniaxial magnetic anisotropy2. However, the induced uniaxial magnetic anisotropy fields are usually in the range of <50 Oe, which leads to limited ferromagnetic resonance frequency of < 3 GHz for most of the metallic magnetic films3. Several different approaches have been investigated for achieving high uniaxial magnetic anisotropy in SMFs, such as composition gradient sputtering4, oblique sputtering5, facing target sputtering6, exchange coupling7, and magnetoelectric coupling8, etc.

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