Abstract
Nanocrystalline gold incorporated diamond-like carbon (nano-Au/DLC) films were deposited by capacitively coupled plasma (CCP) r.f. chemical vapour deposition (CVD) technique. Gold content in the DLC matrix was controlled by the amount of argon in the argon + methane mixture in the plasma. Field emission properties of these films were studied critically. Bonding environment (sp 2/sp 3 ratio) in these films was obtained from Raman measurements. Modification of the surface with the incorporation of gold nanocrystallites and associated modulation of sp 2/sp 3 ratio in the films culminated in improved field emission properties. Fowler–Nordheim model was used to ascertain the work function ( ϕ) which varied between 19 and 64 meV. The field factor ( β) varied between 172 and 1050.
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