Abstract
A FIB (focused ion beam) system for the repair of clear and opaque photomask defects is described. FIB technology is uniquely capable of repairing submicron clear and opaque defects. Opaque defects are repaired by ion beam sputtering. Clear defects are repaired by the deposition of a tenaciously adherent, opaque carbon film from a hydrocarbon gas. A number of mask repair examples are shown, and the results of adhesion and chemical resistance tests of the carbon films are presented.
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