Abstract
The influence of growth conditions and post-annealing treatments on radio frequency ( r.f.) magnetron sputtered lead zirconate titanate (PZT) thin films have been investigated. By adjusting the plasma discharge parameters, it is possible to control, with stoichiometric single oxide target, the film composition precisely. No excess lead was used either during sputtering (in the target) or during post-deposition annealing. The structural, microstructural and electrical properties have been systematically examined as a function of the annealing treatments. Perovskite structure was obtained by conventional annealing as well as by rapid thermal annealing. The films were dense and crack-free; the film orientation, the microstructure and the surface morphology are directly related to the thermal processes. The ferro-electric properties in terms of coercive field and remanent polarization are also very sensitive to the annealing treatments.
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