Abstract
Ferroelectric and piezoelectric properties of Hf1-xZrxO2 (HZO) and pure ZrO2 films with a layer thickness of up to 390 nm prepared by chemical solution deposition (CSD) are investigated. The piezoelectric properties are measured using a double-beam laser interferometer (DBLI) and piezoresponse force microscopy. It is shown that for 100 nm thick films, the maximum remanent polarization is found for pure ZrO2 and reduces for the increasing hafnium content. A stable remanent polarization of 8 μC/cm2 is observed for ZrO2 film thicknesses between 195 and 390 nm. A piezoelectric coefficient of 10 pm/V is extracted from unipolar DBLI measurements. The observed thickness limitation for atomic layer deposition deposited HZO based ferroelectrics can be overcome by the CSD deposition technique presented in this work. Thick ZrO2 films are promising candidates for energy related applications such as pyroelectric and piezoelectric energy harvesting and electrocaloric cooling as well as for microelectromechanical systems.
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