Abstract
The finite element method (FEA) was used for thermal mechanical behavior analysis of a monochromator subjected to high heat load for a beamline at the High Energy Photon Source (HEPS). Without using reflection mirror, high energy photons deposit directly on the first crystal of DCM (Double Crystal Monochromator) with power density up to 69W/mm2. This paper introduces an indirect cooling structure with multi-channels cut inside the cooling blocks, which can effectively reduce the crystal deformation caused by high heat deposition. The effects of power and power density on crystal temperature and deformation are compared and its variation discipline with the distance between monochromator and light source (undulator) are studied. The research results have reference significance for thermal management of monochromators as well as other optical elements in HEPS.
Highlights
The High Energy Photon Source (HEPS), a 6 G eV diffractionlimited ∼60 pm rad storage-ring light source, is under construction in Beijing, China, and will be operational before 20251
The thermal deformation caused by high brightness and high flux light is an important problem for optical components
The first optical component in a synchrotron radiation beam-line is subjected to a high heat load form the X-ray source,5 monochromator is the first optical element in some HEPS beam lines
Summary
The High Energy Photon Source (HEPS), a 6 G eV diffractionlimited ∼60 pm rad storage-ring light source, is under construction in Beijing, China, and will be operational before 20251. Cryogenic cooling with liquid nitrogen is mainly used to evacuate heat of silicon crystal either by direct cooling or indirect cooling. Cooled silicon monochromator will be used in HEPS, to judge the whether the cooling structure meets the requirements, thermal deformation prediction and thermal management optimization are necessary. The first optical component in a synchrotron radiation beam-line is subjected to a high heat load form the X-ray source, monochromator is the first optical element in some HEPS beam lines. For purpose of reducing surface deformation of crystal, this paper studies the influence of distance from the monochromator to light source on crystal deformation, and compares the differences between two operating conditions (maximum power and maximum power density energy points). The study results have reference significance for the selection of optics position in the beam line
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