Application of fast pulsed power supply to high energy photon source

Abstract

High Energy Photon Source (HEPS) is the next generation of high-brightness photon source based on storage ring planned in China. Its natural emittance of the beam is close to the diffraction limit. As a typical low emittance storage ring (LER), the dynamic aperture of HEPS is far smaller than the physical aperture. Hence the traditional off-axis cumulative injection can not meet the requirements, and only strip-line kicker based on in-line injection scheme can be used. In order to realize bunch-by-bunch control, HEPS requires injecting kicker electrical pulse with a bottom width (3%-3%) of less than 10 ns, a half width (50%-50%) of more than 4.5 ns, an amplitude of +17.5 kV (50 load) and a repetition frequency of more than 50 Hz. A prototype of bipolar fast pulsed power supply based on DSRD has been developed on the project of HEPS-TF. The performance of the prototype can produce a pulse at 50 load with rise time (10%-90%)2.6 ns, fall time (90%-10%) 3.2 ns, FWHM (50%-50%) 5 ns, bottom width (3%-3%) 10 ns, amplitude 18 kV. It can meet the requirement of on-axis swap-out injection which is the baseline injection scheme of HEPS.