Abstract
Etertec HQ-6100 dry film photoresist was used in this work to fabricate soft-lithography masters applied to microfluidic applications. We demonstrated that the use of this photoresist was a convenient alternative to conventional microfabrication approaches based on DRIE and liquid photoresists for fast-prototyping of microfluidic structures. Our method was at least two times faster than conventional processes and required limited investment for equipments. Finally, this approach was applied to the design and fabrication of microfluidic networks used for gradient generation in bulk solution.
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