Fast atom beam-based fabrication of high-efficienct blazed grating using slanting angle control of a substrate

Abstract

This paper presents electromagnetic analysis of Si-based small period blazed reflection gratings for a period of 0.6–1.5 μm in terms of the rigorous coupled wave analysis (RCWA) and its fabrication using fast atom beam (FAB) etching method. The optimized blazed gratings were successfully fabricated on a slanted silicon substrate by FAB etching method, and diffraction efficiencies (DE) for four kinds of gratings were evaluated from optical testing and these results showed good agreement with these theoretical values, respectively.