Far-UVC light as a new tool to reduce microbial burden during spacecraft assembly

Abstract

This work aims to investigate far-UVC light at 222 nm as a new microbial reduction tool for planetary protection purposes which could potentially be integrated into the spacecraft assembly process. The major advantage of far-UVC (222 nm) compared to traditional germicidal UVC (254 nm) is the potential for application throughout the spacecraft assembly process in the presence of humans without adverse health effects due to the limited penetration of far-UVC light into biological materials. Testing the efficacy of 222-nm light at inactivating hardy bacterial cells and spores isolated from spacecraft and associated surfaces is a necessary step to evaluate this technology. We assessed survival of Bacillus pumilus SAFR-032 and Acinetobacter radioresistens 50v1 exposed to 222-nm light on proxy spacecraft surfaces simulated by drying the bacteria on aluminum coupons. The survival fraction of both bacteria followed a single stage decay function up to 60 mJ/cm2, revealing similar susceptibility of both species to 222-nm light, which was independent of the exposure rate. Irradiation with far-UVC light at 222 nm is an effective method to decontaminate the proxy spacecraft materials tested in this study.