Abstract
The main factors responsible for the formation of columnar and layered nanostructures of transition metal boride and nitride films were determined by X-ray diffraction, electron microscopy, and secondary ion mass spectrometry. An expression was obtained for predicting the nanostructures of the deposited films from data on the supersaturation, elastic stresses, and ratios between free boundary energies. The nanocrystallite sizes in certain transition metal nitride and boride films were estimated.
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