Facile synthesis of ordered large-pore mesoporous silica thin film with Im3 m symmetry using n-butanol as the cosurfactant

Abstract

A facile synthesis route to ordered large-pore (10.7 nm) mesoporous silica film with the cubic Im3 m mesostructure is reported in a TEOS–F127–BuOH–HCl–H 2O system through dip-coating method. Characterization by X-ray diffraction, scanning electron microscopy, transmission electron microscopy, and nitrogen sorption reveals that the obtain mesoporous silica material possessed high surface area and large pore diameter. A relative comparison between the mesoporous silica films synthesized with and without BuOH is also presented. A reasonable formation mechanism of the large-pore mesoporous silica film is depicted in this work.