Fabrication technology of a Si nanowire memory transistor using an inorganic electron beam resist process

Abstract

We report on a novel fabrication technology of a Si nanowire memory transistor using an inorganic SiO2 electron beam (EB) resist process. The inorganic EB resist process technique was put to practical use in Si nanodevice fabrication for the first time. We have successfully demonstrated the 15-nm-wide and 20-nm-thick Si nanowire memory transistor with a Si nanodot less than 10 nm in diameter. In the fabricated Si nanowire nanodot memory transistor, we have observed a large electron memory effect, i.e., a threshold voltage shift ΔVth of 2.2 V at room temperature. It is experimentally shown that the inorganic EB resist process is promising for fabricating various Si nanodevices.