Fabrication process responsible for fundamentally improving Silicon X-ray microcalorimeter arrays

Abstract

We have developed an improved microcalorimeter array that will be used on the AstroE-2 satellite mission. The 6×6 array consists of a grid of 36 suspended pixels. Each 1.5μm thick pixel has an ion-implanted thermometer, four thermal links (support beams), and four X-ray absorber support tabs. Improvements in Silicon micro-machining capabilities and the availability of custom Silicon-on-Insulator (SOI) wafers has enabled us to precisely control pixel geometry, lead widths, and develop a more compact array. Knowing the silicon thickness, we can calculate a precise implant dose for the thermometer. Using a high-temperature anneal, we can uniformly diffuse the implant throughout the depth of the top layer of the SOI wafer. Defining the length, width, and thickness of the support beams, we can control the thermal conductance of the pixel. Advancements in polymer-photo resists have enabled us to develop a new absorber support tab attachment scheme resulting in more controlled heat dissipation from the absorber to the thermometer on the pixel. An overview of fabrication improvements focusing on these topics will be discussed.