Abstract
Ceramic electrochemical devices, such as solid oxide fuel cell (SOFC), require a high electrochemical reaction density. UV-nanoimprint lithography (UV-NIL) process comprising ceramic particles and a UV-curable resin as the binder was proposed to fabricate a high-aspect-patterned ceramic for SOFC. The proposed method was used to mold ceramic slurry with UV-curable binder that can cure with electrochemically-optimized ceramic particles. Last, the UV-cured ceramic was sintered, whereupon ceramic micropatterns were obtained on a ceramic substrate. The study chose a UV monomer and photo-initiator that would not contaminate SOFC material. The appropriate ratio of the monomer to the photo-initiator were investigated to conduct UV-NIL despite containing high ceramic concentration which absorbs UV wave length. The ratio of UV-curable resin to ceramic particles that resulted in minimal cracks during sintering process was found. Finally, the fabrication of ceramic pillar patterns was demonstrated.
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