Abstract
Fabrication parameters of antireflection films made of spin coating hollow SiO2 nanospheres were investigated. The film thickness, film morphology and optical properties of the antireflection films were observed dependent on speed of spin coating. With a proper coating speed to produce film of desirable thickness, the antireflection film shows transmittance of 98.7% at λ = 550 nm. We applied a two-step coating to serve as an alternative way for fabrication of hollow SiO2 nanospheres antireflection films. For the antireflection films made by the two-step coating, a relatively improved uniformity in surface morphology and decrease in diffuse reflectance were found. The results suggest using the two-step coating method can be beneficial for uniformity in film morphology and optical properties of the antireflection films.
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