Abstract
The process of the reactive ion etching of synthetic monocrystalline diamond with thick aluminum oxide and aluminum nitride protective masks for increasing the surface of diamond was studied. The etching selectivity of aluminum oxide and aluminum nitride were determined. The relief structures in a shape of ribs with more than 2 µm height, 5 µm period and 45° profile slope were fabricated on diamond surface. These structures increase the effective surface area 1.3 times.
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