Abstract
A novel fabrication process is proposed for manufacturing thin-film metal Fresnel lenses for X-ray applications. This process combines diamond turning technology and photolithographic processes. To prevent thin-film lens substrates from deflection during diamond turning, films were prepared on single crystalline silicon wafers by electrolytic plating. After the Fresnel lens structure is generated on the metal thin films by diamond turning, the silicon substrate was then removed selectively by reactive ion etching. Experimental results demonstrated that the proposed hybrid fabrication process achieves submicron form accuracy and nanometer surface roughness.
Published Version
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