Abstract
A fabrication process has been developed to create suspended carbon microelectromechanical system (C-MEMS) structures. SU-8, a negative photoresist, was used as the starting material and was converted to the desired carbon microstructures using pyrolysis in an inert atmosphere. Suspended carbon-micro and nano electromechanical system (C-MEMS/NEMS) structures with feature sizes down to 500 nm were fabricated by ultra violet/electron beam (EB) lithography and pyrolysis. The problem of charging of the non-conductive SU-8 surface was solved by partially masking a thin metal layer to prevent the repulsion of negative charged electrons before EB writing. Complex suspended C-MEMS structures, such as bridges and networks have been formed. This fabrication method can accurately and reproducibly produce various suspended C-MEMS structures which have applications in microelectronics and biosensing.
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