Abstract
Fabrication of single crystal diamond microchannels on HPHT diamond substrate has been carried out successfully. Firstly, tungsten film was patterned on diamond substrate surface by conventional photolithography and magnetron sputtering methods. Secondly, single crystal diamond epitaxial layer was grown on the surface of the patterned substrate by microwave plasma chemical vapor deposition system. Then the tungsten film was etched out by acid to form microchannel. Finally, different color liquid was introduced to check the hollow of microchannels. The morphology of the microchannels has been investigated by optical microscope, scanning electron microscope and atomic force microscope. The crystallinity was evaluated by X-ray diffraction systems and Raman spectroscope technology.
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