Abstract
AbstractA detailed discussion of the preparation of a buried silica‐based optical waveguide by sputtering is presented. The morphological evolution of SiO2 deposited on a ridge structure and smoothing the side wall are discussed on the basis of both experimental and computer simulation results. A new method of fabricating silica‐based optical waveguides with smooth side walls by radio‐frequency (rf) sputtering is described. A waveguide of either triangular or trapezium‐shaped cross section is fabricated on a prepared ridge in the substrate by rf sputtering. An analysis of the waveguide thus obtained of a triangular‐shaped cross section is made by the propagating beam method (PBM). The potential for application of the technique to optical waveguides is examined.
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