Abstract
A method for fabricating precise silicon die edges aligned to a precision of 0.5 mum to the features on the front side of the die without damaging these features is described in this paper. A two step die edge fabrication process with die edge defined by silicon DRIE on the front side of the die and edge grinding on the backside of the die was developed. The features on the front-side of the die close to the edge are not mechanically damaged by this technique. Test structure design and fabrication to measure the precision of die edge with respect to the features on the front side is discussed. Die cleaning process using a protective coating deposited prior to the sawing and grinding processes is also presented.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
