Abstract
Nanoimprint lithography (NIL) was used to create a film with photonic crystal structures in the organic light-emitting diode (OLED) component. By utilizing various stamps, such as with photonic crystal structures and with grating structures in polymethylmethacrylate (PMMA) were studied. The better formability belongs to a stamp of photonic crystal patterns and molecular weight of PMMA in 350K and 996+15K in double layers. A photonic crystal with nanostructures in a period of 400nm was fabricated as a photonic crystal film and was integrated into an organic light emitting diode (OLED). The experiments show that the OLED without photonic crystal films behaves 2.11cd/m^2 for luminous intensity, 2.336cd/A for lightening efficiency (@hL), and 0.475lm/W for lightening power (@hP), under the driving voltage of 10V and current of 0.009012A; the OLED with the photonic crystal films behaves 250cd/m^2 for luminous intensity and 2.774cd/A for @hL, and 0.871lm/W for @hP, under the same driving voltage and same current, which shows that the latter performs well.
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