Abstract

Silicon suboxide (SiOx, x ≈ 1) is a substoichiometric silicon oxide with a large refractive index and optical absorption coefficient that oxidizes to silica (SiO2) by annealing in air at ~1000 °C. We demonstrate that nanostructures with a groove period of 200–330 nm can be formed in air on a silicon suboxide film with 800 nm, 100 fs, and 10 Hz laser pulses at a fluence an order of magnitude lower than that needed for glass materials such as fused silica and borosilicate glass. Experimental results show that high-density electrons can be produced with low-fluence femtosecond laser pulses, and plasmonic near-fields are subsequently excited to create nanostructures on the surface because silicon suboxide has a larger optical absorption coefficient than glass. Calculations using a model target reproduce the observed groove periods well and explain the mechanism of the nanostructure formation.

Highlights

  • Structures smaller than the wavelength of light can induce optical anisotropy and rotatory and resonant scattering [1,2]

  • We demonstrate that nanostructures with a groove period of 200–330 nm can be formed in air on a silicon suboxide film with 800 nm, 100 fs, and 10 Hz laser pulses at a fluence an order of magnitude lower than that needed for glass materials such as fused silica and borosilicate glass

  • Experimental results show that high-density electrons can be produced with low-fluence femtosecond laser pulses, and plasmonic near-fields are subsequently excited to create nanostructures on the surface because silicon suboxide has a larger optical absorption coefficient than glass

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Summary

Introduction

Structures smaller than the wavelength of light can induce optical anisotropy and rotatory and resonant scattering [1,2]. Using the birefringence of nanostructures formed in fused silica with fs pulses, Beresna et al developed a spatial-distributed wave plate that can convert a Gaussian beam to structured light such as a radially polarized beam or an optical vortex [12]. This remarkable optical element is currently commercially available. The linearly polarized fs laser pulses were focused in air at nor3mofa1l0 incidence on the silicon suboxide films with a lens with a 250 mm focal length. The focal spot size was 120 μm in diameter at 1/e2 of the maximum intensity

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Excited layer Silicon suboxide
Conclusions
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