Abstract
0.9Pb(Mg 1/3 Nb 2/3 )O 3 – 0.1 PbTiO 3 (0.9 PMN-0.1 PT) thin films were deposited on Si substrates by pulsed laser deposition using SrO as buffer layer and a conducting perovskite SrRuO 3 electrode. For comparison, we have also grown 0.9 PMN-0.1 PT thin films on commercially available Pt/TiO 2 /SiO 2 /Si substrates. PMN-PT thin films grown on SrRuO 3 /SrO/Si are pure and oriented such as (001)film/(001)lower electrode/(001)substrate. However, 0.9 PMN-0.1 PT thin films grown on Pt/TiO 2 /SiO 2 /Si substrate show preferential (111) orientation of the perovskite phase with the presence of some (100) and (110) reflections. The lower electrode plays the crucial role to control the microstructure of the thin films. The sizes of the grains depend upon the nucleation density and the rate of growth onto the lower electrode used. The surface of the 0.9 PMN-0.1 PT thin films grown on SrRuO 3 (001) is quite different from that of the film on Pt (111). Well connecting granularly shaped grains are present at around 2 μm diameter on SrRuO 3 and the grain sizes in case of films grown on the Pt/TiO 2 /SiO 2 /Si substrate is in the range of .4 to .8 μm.
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