Fabrication of nanofins of TiO 2 and other metal oxides via the surface sol–gel process and selective dry etching

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We herein report the fabrication of nanofins of TiO 2 and other metal oxides via photolithography and the surface sol–gel process. A photolithographically fabricated line template on a silicon wafer was coated with a metal oxide nanolayer by the surface sol–gel process. In this study, TiO 2, ZrO 2, HfO 2, SiO 2/TiO 2 and were employed as coating materials. Then, the topmost portion of the coating layer and the template were successively removed using CHF 3 and oxygen plasma, respectively, leaving the sidewalls of the meal oxide layers remaining on the substrate. These fins were self-supporting, and the composition and the inner layer structure of metal oxide walls were controlled by changing the materials and the coating sequence. In the case of TiO 2, the height/width ratio of the fin was 13.2 at the 30-cycle coating and is surprisingly high when compared to that of the conventional photolithography processes.