Abstract

Block copolymer (BCP) self-assembly, as a novel bottom-up patterning technique, has received increasing attention in the manufacture of nanodevices because of its significant advantages of high resolution, high throughput, low cost, and simple processing. BCP self-assembly provides a very powerful approach to constructing diverse nanoscale templates and patterns that meet large-scale manufacturing practices. For the past 20 years, the self-assembly of BCPs has been extensively employed to produce a range of nanodevices, such as nonvolatile memory, bit-patterned media (BPM), fin field-effect transistors (FinFETs), photonic nanodevices, solar cells, biological and chemical sensors, and ultrafiltration membranes, providing a variety of configurations for high-density integration and cost-efficient manufacturing. In this review, we summarize the recent progress in the fabrication of nanodevices using the templates of BCP self-assembly, and present current challenges and future opportunities.

Highlights

  • A seed of the nanotechnology concept was first planted by the famous physicist Feynman (1959) in his lecture There’s Plenty of Room at the Bottom

  • Block copolymer (BCP) self-assembly has emerged as a novel nanopatterning technique that is widely used in manufacturing advanced nanodevices

  • BCP self-assembly is endowed with many significant merits, such as high throughput, high efficiency, good compatibility, excellent scalability, low cost, and process simplicity

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Summary

INTRODUCTION

A seed of the nanotechnology concept was first planted by the famous physicist Feynman (1959) in his lecture There’s Plenty of Room at the Bottom. The top-down approach mainly employs lithography technologies that include deep ultraviolet (DUV) lithography (Sanders, 2010), extreme ultraviolet (EUV) lithography (Päivänranta et al, 2011), nanoimprint lithography (NIL) (Barcelo and Li, 2016), and electron beam lithography (EBL) (Chen, 2015). Among these technologies, DUV lithography is the most commonly used patterning technology in the semiconductor industry for manufacturing nanodevices

BCP Template for Nanodevice Fabrication
Nonvolatile Memory
Bit Patterned Media
Photonic Nanodevices
Solar Cells
Ultrafiltration Membranes
Findings
CONCLUSION
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