Abstract
We have developed multi-pixel TES microcalorimeters in order to realize high-energy resolution and X-ray imaging. A Sn absorber and a Bi absorber were formed on Si3N4 and SiO2 membrane using two-step exposure photolithography and electrodeposition. A FEM analysis was carried out to investigate the performance of the X-ray microabsorbers. In addition, a superconducting through-wafer interconnection was demonstrated considering the future X-ray imager using microcalorimeters. Detail of the fabrication techniques, characteristics and simulation results of two types of the microabsorbers, as well as those of the calorimeters are described.
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