Abstract
Microstructure patterning in single-crystal chemical vapor deposition (SC-CVD) diamond films was investigated to establish a direct patterning procedure by using proton beam writing with a focused microbeam of protons. Test microstructural patterns on SC-CVD diamond with different total fluences from 0.5 to 10 pC/μm2 were formed with a probe diameter of approximately 1 μm, a maximum scanning area of 800 × 800 μm, and a beam current of up to 100 pA. The most intensively irradiated pattern with beam fluence of 10 pC/μm2 was visualized with both transmission and reflection optical microscopy. The other patterns created with lower beam fluences were characterized by the changes in reflective index and were visible only in the transmission microscopy images. The depth of patterns was precisely controlled by changing proton energies in range of 0.75–3 MeV. The structures in depth from 5 to 45 μm were successfully observed in optical microscope images.
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