Abstract
We have developed a new technique for fabrication of 1:1 submicron gratings by means of single step electron beam lithography coupled with thin film deposition. The edge profile and the width ratio (line-to-groove) are easily controlled. Metal like gold or copper transmission gratings can be produced by an additional lift-off process. A 30kV electron beam was used to generate 500nm lines on standalone ∼2.3μm thick PMMA/Titanium. The dimensions of fabricated features together with their surface morphology and profiles were investigated by optical microscope and SEM. Low current slow writing coupled with special development is optimized to write structures smaller than the thickness of the resist membrane.
Sign-in/Register to access full text options 
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
