Abstract
Micro-cell structures with side-walls as thin as 0.70 μm and aspect ratios as high as 6.7 are fabricated by single-layer writing through two-photon-absorption (TPA) photopolymerization. The use of a moderate-numerical-aperture (N.A.) objective lens to obtain a much more elongated voxel and an in situ ultraviolet (UV) pre-exposure step to improve the sensitivity of TPA photopolymerization are the main factors responsible for the high aspect ratio and sub-diffraction-limit resolution that are achieved.
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