Abstract
Nanoscale periodic structures have been utilized in the scintillator field to obtain enhanced light extraction efficiency. Sufficient structure depth is necessary to achieve better extraction efficiency. Recently, a soft X-ray interference lithography (SXIL) has been developed in the Shanghai Synchrotron Radiation Facility (SSRF). SXIL can be used to fabricate a high aspect ratio pattern due to the uniform distribution of the beam dose at the photoresist depth. A grating mask with a new photon stop layer was attempted, mainly consisting of Perm alloy, and it was optimized for the SXIL to increase the entire service life. Preliminary results suggest that PMMA structure with an aspect ratio of up to 3 has been successfully manufactured using SXIL techniques. Therefore, this technique has been studied to fabricate the artificial nanostructure on the scintillator in the high efficiency radiation detector area.
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