Abstract
AbstractPorous diamond (PD) films have been grown on sintered WC‐13 wt.%Co substrates by bias enhanced hot filament (HF) chemical vapour deposition (CVD) methods and characterized by scanning electron microscopy (SEM), laser Raman spectroscopy and X‐ray diffraction (XRD). The PD films show excellent adhesion under Rockwell indentation testing. Factors encouraging the growth of diamond film with high porosity are discussed. magnified image
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