Abstract

In this study, we present a novel technique for the fabrication of 2D hybrid photonic crystal structures based on ordered porous silicon array. Each unit of the array consists of a centric micro-sized macropore and six surrounding nano- pores. The fabrication process is based on photoelectrochemical etching, combined with steps of oxidation, CMP and TMAH etching. We investigate the absolute photonic band gap in such made 2D hybrid photonic crystal composed of triangular and honeycomb lattices. Our results indicate strongly that the photonic band gap is very sensitive to the structure parameters (especially to the diameter of nano-pores), and it can be an effective way to enlarge the absolute photonic band gap by modifying the pore diameters.

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