Fabrication of 197Au-backed Silicon target for In-beam Gamma-ray spectroscopy experiment

Abstract

The fabrication of stable 197Au-backed natural Si targets with a thickness ranging from ∼ 400 μg/cm2 to ∼ 1.1 mg/cm2 using an electron beam evaporation technique is discussed. In one of the attempts, a graphite sheet was used as an evaporation source, which proves to be an efficient method in terms of minimal wastage of source material. Characterizations of the fabricated targets using various technique revealed that the targets were uniform in thickness and had negligible contamination. The optimization of evaporation parameters in the present work enhances the potential for future fabrication of isotopically enriched Si targets.