Abstract
A microaxicon is fabricated in the quartz substrate by the combination of grayscale direct laser writing and inductively coupled plasma etching. The atomic force microscopy measurement result indicates each period of the fabricated quartz microaxicon has a fine continuous relief axicon pattern and the maximum height of each period remains quite consistent. The intensity distributions of the beam generated by the microaxicon are theoretically calculated by using the Fresnel diffraction integral and experimentally recorded with a CCD camera at different propagation distances, respectively. The results of theoretical calculation and optical measurement both show the quartz microaxicon can generate a high-quality quasi-Bessel beam and the working distance is tested as at least 10 mm.
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