Abstract
We describe the fabrication and performance of λ/4 shifted DFB laser arrays made using electron beam-generated near field holographic grating masks. Precision requirements for these masks are discussed. We also examine the physical phenomena that contribute to wavelength variations in DFB lasers. Projections are made regarding the epitaxial thickness, composition, and waveguide etching control required to achieve a source wavelength absolute reproducibility of ±0.1 nm.
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