Abstract
Arrays of lines and dots were patterned on silicon substrates by electron beam lithography and reactive ion etching. Co/Pt multilayers were sputter-deposited on these patterned substrates to realize perpendicular patterned media for ultra high-density magnetic recording. Magnetic material thus covers the top of the lines and dots, the bottom of the grooves between nanostructures, and to a lesser extent, the sidewalls. Magnetic properties were characterized by both macroscopic and magnetic force microscopy experiments. From the results obtained from high-resolution transmission electron microscopy (TEM) experiments, we propose a new approach for realizing patterned magnetic media using the side edges instead of the top of the dots.
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