Abstract
This paper reports the fabrication and analysis of a back-to-back pyramidal horn antenna based on Micro-electromechanical Systems (MEMS) technology, which is used in terahertz (THz) applications. This method is able to manufacture antenna with various geometrical configuration embedded in Si substrates. The dimensional tolerance of this technique is determined by the lithography process, which could be controlled down to tens nm. Therefore, this technique is controllable and of high precision and quality. The performance of fabricated antenna device was verified by Ansoft High Frequency Structure Simulator (HFSS) simulation. The result shows that the antenna gain ranges from 10–15dB, and voltage standing wave ratio (VSWR) is less than 2 in the frequency band of 3.25–3.55THz.
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